A simple and easily used ultrasonic cleaning system was designed

and seven kinds of pre-treatment on SiC particles were performed.It is found that an optimized pretreatment process is as follows:ultrasonic cleaning

baking oxidation at high temperature and pre-heating.Micro-fine powder on the SiC particles can be cleaned off at 1000℃after ultrasonic cleaning process

and high temperature baking can promote the reactive wettability.Holding temperature can avoid the occurrence of second absorption.As a result of surface absorption

wettability of particle with the melt can not be improved only by high temperature baking.Absence of small and fine particles can be observed in absorption of the SiC particle after ultrasonic clean for 60min.