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基底对类金刚石薄膜组织性能的影响
Effects of Substrate on Microstructure and Properties of Diamond-like Carbon Films
- 2019年39卷第7期 页码:706-710
纸质出版日期: 2019
DOI: 10.15980/j.tzzz.2019.07.003
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纸质出版日期: 2019 ,
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[1]陈雪娇,周艳文,徐振,张晶,张豫坤,徐帅,陈星宇.基底对类金刚石薄膜组织性能的影响[J].特种铸造及有色合金,2019,39(07):706-710.
Chen Xuejiao, Zhou Yanwen, Xu Zhen, et al. Effects of Substrate on Microstructure and Properties of Diamond-like Carbon Films[J]. Special Casting & Nonferrous Alloys, 2019,39(7):706-710.
采用等离子体增强化学气相沉积技术
在3种不同基底上(不锈钢、铝合金、氮化硅)制备了类金刚石薄膜(DLC)
并对薄膜进行了相关的性能评价。结果表明
3种基底上制得的DLC薄膜结构致密
表面光滑且具有良好的均匀性;AFM表征结果表明
沉积的薄膜为无定型结构;Raman光谱分析显示沉积的薄膜为类金刚石薄膜;在非金属上采用等离子体化学气相沉积技术可以制备出DLC薄膜。与铝合金、氮化硅相比
选用不锈钢作为基底的薄膜硬度和弹性模量与基底差异更小
膜基结合力较强
可达13.55N;基底为氮化硅的薄膜摩擦因数较低
为0.094 8
但膜基结合力较差
仅为6.63N。此外
在相同工艺下
基底种类对薄膜的成分和耐摩擦磨损性能影响显著
但对薄膜的表面形貌和粗糙度无明显影响。
Diamond-like carbon films were prepared on three different substrates
such as stainless steel
aluminium alloy and silicon nitride
by plasma enhanced chemical vapor deposition(PECVD)using tetramethylsilane as the reaction source
and the performance of the films was evaluated.The surface morphology and structure of the films prepared were analyzed by atomic force microscopy(AFM)and Raman spectroscopy(Raman)
respectively.The hardness and elastic modulus of the films were measured by nanoindentation technique.The mechanical properties of the films were measured by friction and wear tester.The results of AFM characterization show that the deposited films present amorphous structure.Raman spectroscopy analysis shows that the deposited films belong to diamond-like films.DLC films can be prepared on non-metallic substrates by plasma chemical vapor deposition technology.DLC films on three substrates have compact structure
smooth surface and good uniformity.Compared with those of ones on aluminium alloy and silicon nitride
the hardness and elasticity modulus of the film on stainless steel as the substrate are less different from that of the substrate
and the stronger adhesion between the film and the substrate can be observed
reaching 13.55 N.The friction coefficient of the film with silicon nitride as the substrate is 0.094 8
however the adhesion of the film with silicon nitride as the substrate is poor
only 6.63 N.In addition
under the same experimental conditions
the composition and wear resistance of the films can be affected significantly by the type of substrates
while the surface morphology and roughness of the films are affected slightly.
DLCPE-CVD技术掺杂拉曼AFM
DLCPE-CVD TechnologyDopingRamanAFM
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