Al-20 Si functionally gradient materials under pulsed magnetic field was fabricted.Effects of pulse voltage

pulse frequency

mold temperature and pouring temperature on the morphology and distribution of primary silicon in the Al-20 Si gradient alloy were investigated.The results reveal that Al-20 Si functionally gradient material can be prepared successfully by pulsed magnetic field.Primary silicon is segregated in the edge

and it is absent in the center position.In the range of 0

1

50 V

with the increase of the pulse voltage

morphology of primary silicon is changed from small blocks to large lath shape

and the average distribution width is decreased gradually.In the range of 1

1

0 Hz

the average distribution width of primary silicon is decreased with the increase of pulse frequency.When the pouring temperature is at 690

7

80℃ or mold temperature is at 400

7

00℃

with the increase of pouring temperature or mold temperature

the average width of primary silicon is decreased at first and then increased.