直流氢电弧等离子体蒸发法制备纳米Cu粉

安少华; 张振忠; 路成杰; 周剑秋

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直流氢电弧等离子体蒸发法制备纳米Cu粉
Preparation of Nanometer-scale Copper Powders by Hydrogen DC （Direct Current） Arc Plasma Evaporation
2007年第6期页码：488-490
纸质出版日期： 2007 ，
DOI：

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[1]安少华,张振忠,路成杰,周剑秋.直流氢电弧等离子体蒸发法制备纳米Cu粉[J].特种铸造及有色合金,2007(06):488-490+410.

An Shaohua, Zhang Zhenzhong, Lu Chengjie, et al. Preparation of Nanometer-scale Copper Powders by Hydrogen DC （Direct Current） Arc Plasma Evaporation[J]. Special Casting & Nonferrous Alloys, 2007,(6):488-490.
[1]安少华,张振忠,路成杰,周剑秋.直流氢电弧等离子体蒸发法制备纳米Cu粉[J].特种铸造及有色合金,2007(06):488-490+410. DOI：

An Shaohua, Zhang Zhenzhong, Lu Chengjie, et al. Preparation of Nanometer-scale Copper Powders by Hydrogen DC （Direct Current） Arc Plasma Evaporation[J]. Special Casting & Nonferrous Alloys, 2007,(6):488-490. DOI：

摘要

采用99·99%的高纯Cu

通过自行设计的直流电弧等离子体蒸发设备实现了高产率纳米Cu粉的制备。系统研究了电流、氢氩比、充气压力3个工艺参数对纳米Cu粉产率及粒度的影响。利用X射线衍射（XRD）、透射电子显微镜（TEM）和选区电子衍射（ED）以及SimplePCI软件对试样的成分、形貌、晶体结构和粒径分布进行了分析。结果表明

电流和氢氩比（H2/Ar）分别是对粉体产率和平均粒径影响的显著性因素;所制备的纳米铜粉为多晶结构

平均粒径在29～116nm范围内;在试验参数相近的情况下

产率比同类研究结果提高了26·65倍。

Abstract

We have developed a hydrogen DC arc plasma evaporation apparatus to prepare nanometer-scale copper powder with 99.99% pure copper.The effects of three processing parameters

including current

hydrogen/Ar ratio and air pressure

on the product rate and granularity of copper powder have been analyzed systematically.The composition

morphology

crystal structure and particle distribution in the copper powders have been analyzed by XRD

TEM and ED as well as Simple PCI software.The results show that the dominant factors influencing the product rate and average particle diameters are current and H2/Ar ratio.The prepared nanometer-scale copper powder is characterized by multi-crystal structure with the average diameters in the range of 29 to 116 nm.The product rate is increased by 27.65 time compared with the results by other investigation results at the same parameters.