Optimization of Cr<sub>2</sub>O<sub>3</sub> Process Parameters for Copper Alloy Plasma Spraying Based on Grey Target

Zhang Xiaofan; Lu Jie

doi:10.15980/j.tzzz.2017.03.005

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Optimization of Cr₂O₃ Process Parameters for Copper Alloy Plasma Spraying Based on Grey Target
Vol. 37, Issue 3, Pages: 249-252(2017)
Published： 2017 ，
DOI： 10.15980/j.tzzz.2017.03.005

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[1]张晓帆,卢杰.基于灰靶的铜合金等离子喷涂Cr_2O_3工艺参数优化[J].特种铸造及有色合金,2017,37(03):249-252.

Zhang Xiaofan, Lu Jie. Optimization of Cr₂O₃ Process Parameters for Copper Alloy Plasma Spraying Based on Grey Target. [J]. Special Casting & Nonferrous Alloys 37(3):249-252(2017)
[1]张晓帆,卢杰.基于灰靶的铜合金等离子喷涂Cr_2O_3工艺参数优化[J].特种铸造及有色合金,2017,37(03):249-252. DOI： 10.15980/j.tzzz.2017.03.005.

Zhang Xiaofan, Lu Jie. Optimization of Cr₂O₃ Process Parameters for Copper Alloy Plasma Spraying Based on Grey Target. [J]. Special Casting & Nonferrous Alloys 37(3):249-252(2017) DOI： 10.15980/j.tzzz.2017.03.005.

摘要

提出了一种正交试验与灰靶模型相结合的H59黄铜表面等离子喷涂Cr2O3的工艺参数优化方法。以正交试验数据为基础

利用双基点灰靶模型对数据进行分析来实现工艺参数的优化。以电弧电流、Ar气流量、H2气流量、喷涂距离为优化工艺参数

以涂层硬度、涂层结合强度、涂层腐蚀速度、涂层磨损量为综合工艺优化目标。通过权重求和的方式将多目标问题转化为单目标优化问题

以正、负靶心为衡量尺度

根据各试验方案与靶心的贴近度大小确定方案的优劣

平均贴近度最大的工艺水平为最优水平。

Abstract

An orthogonal experiment and grey target model was presented to optimize the process parameters of plasma sprayed Cr

on the surface of H59 brass.Two-point grey target model was adopted for processing and analyzing the test data in order to optimize the process parameters based on orthogonal test data

where arc current

argon flow

hydrogen flow and sprayed distance were taken as optimized parameters and coating hardness

tensile bond strength

coating porosity

and wear resistance of the coating as a comprehensive optimization goal.The multi-objective problem was transformed into a single objective optimization problem based on weight sum by using positive and negative target for measurement.According to the test plan and target of closeness degree program

the sketch was determined

and close to the maximum degree at the process level is taken as the optimal level.