Guo Qiaoqin1, Jiang Bailing1, Li Jianping2, et al. Effects of Substrate Bias Voltage on Morphologies and Properties of Al-20Sn Coating Deposited by Non-equilibrium Magnetron Sputtering. [J]. Special Casting & Nonferrous Alloys 31(4):308-310(2011)
Guo Qiaoqin1, Jiang Bailing1, Li Jianping2, et al. Effects of Substrate Bias Voltage on Morphologies and Properties of Al-20Sn Coating Deposited by Non-equilibrium Magnetron Sputtering. [J]. Special Casting & Nonferrous Alloys 31(4):308-310(2011)DOI:
Effects of Substrate Bias Voltage on Morphologies and Properties of Al-20Sn Coating Deposited by Non-equilibrium Magnetron Sputtering
摘要
采用非平衡磁控溅射在铝基轴承合金表面制备了AlSn20镀层
分析不同基体偏压对AlSn20镀层的组织形貌、硬度、膜基结合力、摩擦因数等的影响。结果表明
非平衡磁控溅射AlSn20镀层
基体偏电压在-60~-120V范围内
镀层呈层状生长
随着基体偏电压增大
镀层由粗大结构向细晶结构变化
镀层硬度与基体偏电压成反比
当偏电压为-120V时
镀层硬度(HV0.025)最高为80
镀层与基体结合力最高可达35N
镀层的摩擦因数最低为0.15。
Abstract
The Al-20Sn coatings on aluminum bearing alloy were deposited by magnetron sputtering technology.Effects of substrate bias voltages on microstructure
hardness
bonding strength and frictional coefficient of the coatings were analyzed.It is found that coating exhibits lamellar growth with substrate bias voltage at-60~-120V.With increasing in substrate bias voltage
film structure is transformed from coarse structure to fine one.Hardness of the coatings is inversely proportional to the substrate bias voltage.With substrate bias voltage of-120V
hardness
bonding strength between coating and the substrate and frictional coefficient reach up to HV80