脉冲电源调控Cu液内氧化夹杂的分布
Pulse Power Regulation of Oxide Inclusion Distribution in Molten Copper
- 2025年45卷第3期 页码:456-463
收稿日期:2024-02-27,
修回日期:2024-03-27,
录用日期:2024-04-19,
纸质出版日期:2025-03-20
DOI: 10.15980/j.tzzz.T20240064
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收稿日期:2024-02-27,
修回日期:2024-03-27,
录用日期:2024-04-19,
纸质出版日期:2025-03-20
移动端阅览
针对Cu液中存在的氧化夹杂缺陷,利用
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与无氧铜熔体的电导率差异,采用多参数可调脉冲电源通电装置,研究了脉冲电源影响氧化物夹杂分布规律,以对Cu液进行净化。研究发现,脉冲电源使Cu液中的夹杂物在电磁场作用下做迁移运动,
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氧化夹杂在电磁力以及电迁移力下进行定向迁移,并富集在阴极电极附近区域,且在阴极位置的纵切面分布也不同。因此,通过脉冲电流处理能够改变Cu液中的夹杂物分布,从而达到特定部位净化除杂效果。
Aiming at the oxide inclusion in Cu liquid, a multi-parameter power-on device with adjustable pulse was employed to investigate effect of pulse power supply on oxide inclusion distribution according to the conductivity difference between SiO
2
or Fe
2
O
3
and oxygen-free copper melt, in order to purify Cu liquid. The results reveal that the pulse power induces the migration of inclusions in the copper melt under the action of electromagnetic fields.
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oxide inclusions undergo directed migration driven by electromagnetic force and electric migration force, which accumulates in the vicinity of cathode electrode with different longitudinal distribution. Consequently, pulse current treatment can alter the inclusion distribution in the copper melt, thereby achieving targeted purification.
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